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表面物理与表面分析(英文版)
作者:
丁训民 杨新菊 王迅 编著
定价:
32.00元
页数:
290页
ISBN:
ISBN7-309-04168-2/O.331
字数:
387千字
开本:
长 16 开
装帧:
平装
出版日期:
2004年10月       
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内容提要


      
      
      
       This textbook provides an lntroduction to surface physics, a growing branch of condensed matter physics,by presenting some basic concepts and techniques commonly used in characterizing solid surfaces at a level suitable for senior undergraduate and new graduate students.The aim is to introduce readers to the fundamentals of modern surface science and relevant methodology from a physics perspective.
       The book consists of eight chapters. Chapter 1 gives an overview of the subject. Chapters 2, 3 and 4 are mainly concerned with surface atomic structures and the major techniques for structural analysis-electron diffraction and scanning probe microscopy. Chapter 5 deals with surface electronic states.Chapters 6,7 and 8 focus on various electron spectroscopies, Including Auger electron,X-ray and ultraviolet photoelectron spectroscopies for both composition and electron-state analyses.As a text, It is designed for use in a one-semester course,featuring the presentation of simple physical pictures rather than detailed mathematical derivations.The book will also be of interest to scientists and engineers working in any field where an overview of surface analysis is needed.

作者简介


       丁训民,1946年7月出生于上海。1970年毕业于复旦大学物理系,留校任教至今。其间曾以访问学者身份去德国、日本、瑞典、香港等国家和地区工作,现为复旦大学物理系教授。主要从事表面物理等课程的教学和半导体表面与界面等方面的研究,已在国内外学术刊物上发表论文一百多篇,撰写过《同步辐射应用概论》和《论表面分析及其在材料研究中的应用》中的部分章节。因在用电子能谱方法研究半导体表面的物理和化学特性方面作出贡献,荣获2003年上海市科技进步一等奖。
       杨新菊,1966年11月出生于浙江。1988年毕业于复旦大学物理系,1994年在复旦大学材料科学系获得博士学位,留校任教至今。现为复旦大学物理系副教授,从事表面物理的教学和科研工作,以及硅基低维材料的制备及性质研究。
       王迅,1934年4月生于上海。1960年1月复旦大学研究生毕业。1984年起任复旦大学教授,1996年起任复旦大学首席教授。1999年当选为中国科学院院士。现从事半导体物理、表面和界面物理,以及硅基低维量子体系的研究。

书摘


       前 言
      
       表面物理是凝聚态物理中的一个新兴分支。如以1964年《表面科学》杂志的创刊作为这一新学科正式问世的标志,其历史迄今正好为40年。自20世纪70年代中以来,随着最强有力的表面分析工具———电子能谱仪的商品化,表面物理获得了迅猛发展。为跟上这一发展势头、满足对表面研究人才日益增长的需求,我们从80年代初开始为复旦大学物理系的研究生开设了《表面物理》和《表面分析技术》两门课。本书是在历年教案的基础上精缩这两门课的内容后写成的。为使其符合用作研究生入门教材的要求,我们力图在书中给出简捷的物理图像,而不是冗长的数学推导,着重阐述什么是表面物理中最基本的问题以及如何从实验上对这些问题进行研究,并尽可能将这一领域的最新研究进展都包括进去。书中的例子绝大部分来自原始研究论文,包括我们自己的论文。
       作为一门与化学、材料科学、信息技术乃至生物学有密切关联的课程,《表面物理与表面分析》在内容安排上可以有许多不同选择。因此,如何从浩瀚的文献中挑选出最合适的材料,使本书能在有限的篇幅范围内包含尽可能多的有价值信息,实在颇费斟酌。现在的内容选择是设想学习这门课的大部分学生将来不一定从事表面研究,但在他们的研究工作中迟早可能会有机会用某些表面分析技术表征 2 Surface Physics and Surface Analysis
       材料和样品。因此,我们在书中收入的内容除表面原子结构和表面电子态的基本知识外,还有适用于众多研究领域的最常用的表面分析技术。至于以后专门从事表面科学某一领域研究或对此有兴趣的人,很容易从图书馆或因特网找到最新的和进一步的参考读物。
       本书共八章。第一、六、七章由王迅撰写,二至四章由杨新菊撰写,五、八两章由丁训民撰写。全书由王迅最后统稿。谨将此书献给复旦大学100周年校庆。
      
       编者
       2004年5月
      
      
      
      
      
      
       CONTENTS
      
       PREFACE
      
       Chapter1 Introduction
      
       1.1 Characteristics of Surface
       1.1.1 Unique Characteristics of Surface
       1.1.2 The Subjects of Surface Physics
      
       1.2 Methodology of Surface Science
       1.2.1 General Idea
       1.2.2 Category of Surface analyticalTechnologies
      
       1.3 Electron Spectroscopy
       1.3.1 Energy Distribution of Secondary Electrons
       1.3.2 Mean Free Path and Surface Sensitivity
      
       1.4 Surface Cleaning Processes
       1.4.1 Clean Surface versusNative Surface
       1.4.2 Methods of Preparing Clean Surfaces
      
       Chapter2 Surface Atomics tructures
      
       2.1 Two Dimensional Crystallography
       2.1.1 Periodicity and Symmetry of Surface Unit Cell
       2.1.2 PointGroup and Plane Group
       2.1.3 Nomenclature of Surface Structures
       2.1.4 Reciprocal Lattice
      
       2.2 Atomic Structures of Ideal Surfaces
       2.2.1 Surface Structures of Metals
       2.2.2 Surfaces of Crystalline Compounds and Alloys
      
       2.3 Surface Relaxation and Reconstruction
       2.3.1 Surface Relaxation
       2.3.2 Surface reconstruction
      
       2.4 Surface Defects
       2.4.1 PointDefects
       2.4.2 Dislocations
       2.4.3 Atomic Steps
      
       Chapter3 Low Energy Electron Diffraction and Reflection High Energy Electron Diffraction
      
       3.1 Principles
       3.1.1 Brief of the Diffraction in Three Dimensions
       3.1.2 Electron Diffraction in Two Dimensions
      
       3.2 Apparatus
       3.2.1 LEED Optics
       3.2.2 Spot Profile Analysis LEED
       3.2.3 Measurement of I-V Curves
       3.2.4 Shield and Compensation of Stray Electromagnetic Field
      
       3.3 Pattern Recognition
       3.3.1 Diffraction Orders
       3.3.2 Pattern Transform
       3.3.3 LEED Patterns of Stepped Surfaces
      
       3.4 LEED I-V
       3.4.1 Experimental and Theoretical I-V Curves
       3.4.2 R Factor
      
       3.5 Reflection High Energy Electron Diffraction
       3.5.1 Principle
       3.5.2 RHEED Analysis
       3.5.3 RHEED Intensity Oscillation
      
       3.6 Appendix
       3.6.1 Compilation of LEED Patterns
       3.6.2 Compilation of RHEED Patterns
      
       Chapter4 Scanning Probe Microscopy
      
       4.1 General Concept
      
       4.2 Scanning Tunneling Microscopy
       4.2.1 Basic Principle
       4.2.2 Apparatus
       4.2.3 WorkingModes and Conditions
       4.2.4 STM Imaging
       4.2.5 Scanning Tunneling Spectroscopy
       4.2.6 STM Nanofabrication and Atom Manipulation
      
       4.3 Atom ic ForceMicroscopy
       4.3.1 Principle
       4.3.2 Apparatus
       4.3.3 WorkingModes of AFM
       4.3.4 Lateral Force Microscopy
      
       4.4 Other Types of Scanning Probe Microscopy
       4.4.1 Scanning Magnetic Force Microscopy
       4.4.2 Scanning Near-field Optical Microscopy
       4.4.3 Ballistic Electron Emission Microscopy
      
       Chapter5 Surface Electronic States
      
       5.1 Existence of Localized Electronic States at Surfaces
       5.1.1 Bulk States and Surface States
       5.1.2 Surface States in One-dimensional Models
      
       5.2 Surface Dangling Bond States
       5.2.1 Dangling Bond and Its Hybrid
       5.2.2 Dangling Bond States at Reconstructed Surfaces
       5.2.3 Dangling Bond States and Fermi Level Pinning
      
       5.3 Adsorbate Induced Electronic States
       5.3.1 Adsorption Phenomena
       5.3.2 Adsorbate-induced Work Function Changes
       5.3.3 Metal-induced Gap States(MIGS)
      
       Chapter6 Auger Electron Spectroscopy
      
       6.1 Principle
       6.1.1 Auger Process
       6.1.2 Energy of Auger Electron
       6.1.3 Yield and Cross-section
       6.1.4 Differential Spectra and Count Spectra
      
       6.2 Apparatus and Experimental Methods
       6.2.1 Experimental Setup
       6.2.2 Experimental Conditions
      
       6.3 Qualitative and Quantitative Analysis
       6.3.1 Element Identification
       6.3.2 Quantitative Composition Analysis
       6.3.3 Chemical Analysis
      
       6.4 Depth Profiling
       6.4.1 Purpose and Methods
       6.4.2 Profile of Compositions
       6.4.3 Interface Location 198
      
       6.5 Scanning Auger Microscopy
       6.5.1 Line-scan
       6.5.2 Auger Map
       6.5.3 Spatial Resolution
      
       Chapter7 X-ray Photoelectron Spectroscopy
      
       7.1 Principle
       7.1.1 Three Step Process of Photoemission
       7.1.2 Binding Energy
      
       7.2 Apparatus
       7.2.1 X-ray Sources
       7.2.2 Electron Energy Analyzer
       7.2.3 Detectors
      
       7.3 Qualitative Analysis
       7.3.1 Energy Calibration
       7.3.2 Peak Discrimination
       7.3.3 Element Identification
      
       7.4 Quantitative Analysis
       7.4.1 Quantification Methods
       7.4.2 Background Subtraction
       7.4.3 Peak Decomposition
       7.4.4 Depth Profile and Depth Information
      
       7.5 Chemical States Studies
       7.5.1 Chemical Shift
       7.5.2 Charging Effect and Compensation
      
       7.6 Appendix-Electron binding energies of elements in periodic table
      
       Chapter8 Ultra-Violet Photoelectron Spectroscopy
      
       8.1 Principle
       8.1.1 UPS versus XPS
       8.1.2 Basic Process
       8.1.3 Selection Rules and Wavefunction Symmetry
      
       8.2 Light Sources
       8.2.1 Discharge Lamp
       8.2.2 Monochromator and Polarizer
       8.2.3 Special Synchrotron Radiation Sources
      
       8.3 Applications
       8.3.1 Identification of Surface Electronic States
       8.3.2 Mapping of Surface and Bulk Bands
       8.3.3 Identification of Adsorbates:Species and Adsorption Sites
      
       References

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